Chemical vs. Physical factors in dry etching induced damage in the Si/GexSi1-x system

RG van Veen, MJ Teepen, EWJM van der Drift, T Zijlstra, K Werner, AH Verbruggen, S Radelaar

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)55-58
Number of pages4
JournalMicroelectronic Engineering
Publication statusPublished - 1997

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