Chemically robust siliconcarbide ultrafiltrastion membranes prepared by low-pressure chemical vapor deposition

A. Jan (Inventor), Sebastiaan Heijman (Inventor)

Research output: Patent

Original languageEnglish
IPCB01D
Priority date16/02/23
Publication statusPublished - 2024

Bibliographical note

Patent:OCT-22-089
Applicant: TU Delft

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