Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation

R van der Heijden, CF Carlstrom, EWJM van der Drift, RW van der Heijden, R Notzel, R Veldhoven, F Karouta, HWM Salemink, A Talneau

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publication2005 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS
Editors s.n.
Place of PublicationGlasgow, Scotland
PublisherIEEE Society
Pages315-318
Number of pages4
Publication statusPublished - 2005
EventInternational Conference on Indium Phosphide and Related Materials - Glasgow, Scotland
Duration: 8 May 200512 May 2005

Publication series

Name
PublisherIEEE

Conference

ConferenceInternational Conference on Indium Phosphide and Related Materials
Period8/05/0512/05/05

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

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