Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation

R van der Heijden; CF Carlstrom; EWJM van der Drift; RW van der Heijden; R Notzel; R Veldhoven; F Karouta; HWM Salemink; A Talneau

Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation

R van der Heijden, CF Carlstrom, EWJM van der Drift, RW van der Heijden, R Notzel, R Veldhoven, F Karouta, HWM Salemink, A Talneau

QN/Kavli Nanolab Delft

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

1 Citation (Scopus)

Original language	Undefined/Unknown
Title of host publication	2005 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS
Editors	s.n.
Place of Publication	Glasgow, Scotland
Publisher	IEEE
Pages	315-318
Number of pages	4
Publication status	Published - 2005
Event	International Conference on Indium Phosphide and Related Materials - Glasgow, Scotland Duration: 8 May 2005 → 12 May 2005

Publication series

Name
Publisher	IEEE

Conference

Conference	International Conference on Indium Phosphide and Related Materials
Period	8/05/05 → 12/05/05

Keywords

conference contrib. refereed
Conf.proc. > 3 pag

Cite this

van der Heijden, R., Carlstrom, CF., van der Drift, EWJM., van der Heijden, RW., Notzel, R., Veldhoven, R., Karouta, F., Salemink, HWM., & Talneau, A. (2005). Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation. In s.n. (Ed.), 2005 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS (pp. 315-318). IEEE.

@inproceedings{55d2d7006e8c4551b7049bc4cd54f613,

title = "Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "{van der Heijden}, R and CF Carlstrom and {van der Drift}, EWJM and {van der Heijden}, RW and R Notzel and R Veldhoven and F Karouta and HWM Salemink and A Talneau",

year = "2005",

language = "Undefined/Unknown",

publisher = "IEEE",

pages = "315--318",

editor = "s.n.",

booktitle = "2005 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS",

address = "United States",

note = "International Conference on Indium Phosphide and Related Materials ; Conference date: 08-05-2005 Through 12-05-2005",

}

van der Heijden, R, Carlstrom, CF, van der Drift, EWJM, van der Heijden, RW, Notzel, R, Veldhoven, R, Karouta, F, Salemink, HWM & Talneau, A 2005, Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation. in s.n. (ed.), 2005 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS. IEEE, Glasgow, Scotland, pp. 315-318, International Conference on Indium Phosphide and Related Materials, 8/05/05.

Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation. / van der Heijden, R; Carlstrom, CF; van der Drift, EWJM et al.
2005 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS. ed. / s.n. Glasgow, Scotland: IEEE, 2005. p. 315-318.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation

AU - van der Heijden, R

AU - Carlstrom, CF

AU - van der Drift, EWJM

AU - van der Heijden, RW

AU - Notzel, R

AU - Veldhoven, R

AU - Karouta, F

AU - Salemink, HWM

AU - Talneau, A

PY - 2005

Y1 - 2005

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SP - 315

EP - 318

BT - 2005 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS

A2 - s.n., null

PB - IEEE

CY - Glasgow, Scotland

T2 - International Conference on Indium Phosphide and Related Materials

Y2 - 8 May 2005 through 12 May 2005

ER -