Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP

CF Carlstrom, R van der Heijden, F Karouta, RW van der Heijden, HWM Salemink, EWJM van der Drift

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	6-9
Number of pages	4
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	24
Issue number	1
Publication status	Published - 2006

Keywords

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title = "Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP",

keywords = "academic journal papers, CWTS 0.75 <= JFIS < 2.00",

author = "CF Carlstrom and {van der Heijden}, R and F Karouta and {van der Heijden}, RW and HWM Salemink and {van der Drift}, EWJM",

year = "2006",

language = "Undefined/Unknown",

volume = "24",

pages = "6--9",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "1",

}

TY - JOUR

T1 - Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP

AU - Carlstrom, CF

AU - van der Heijden, R

AU - Karouta, F

AU - van der Heijden, RW

AU - Salemink, HWM

AU - van der Drift, EWJM

PY - 2006

Y1 - 2006

KW - academic journal papers

KW - CWTS 0.75 <= JFIS < 2.00

M3 - Article

SN - 1071-1023

VL - 24

SP - 6

EP - 9

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 1

ER -