Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP

CF Carlstrom, R van der Heijden, F Karouta, RW van der Heijden, HWM Salemink, EWJM van der Drift

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)6-9
Number of pages4
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Issue number1
Publication statusPublished - 2006


  • academic journal papers
  • CWTS 0.75 <= JFIS < 2.00

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