Cl2-based inductively coupled plasma etching of photonic crystals in InP,

RW van der Heijden, CF Carlström, MSP Andriesse, EWJM van der Drift, EJ Geluk, F Karouta, P Nouwens, YS Oei, T de Vries, HWM Salemink

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationProceedings Symposium IEEE=LEOS Benelux chapter, 2004
EditorsG Mortiier, P van Daele
PublisherIEEE Society
Pages287-290
Number of pages4
ISBN (Print)9076546061
Publication statusPublished - 2004

Publication series

Name
PublisherIEEE

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

Cite this

van der Heijden, RW., Carlström, CF., Andriesse, MSP., van der Drift, EWJM., Geluk, EJ., Karouta, F., Nouwens, P., Oei, YS., de Vries, T., & Salemink, HWM. (2004). Cl2-based inductively coupled plasma etching of photonic crystals in InP, In G. Mortiier, & P. van Daele (Eds.), Proceedings Symposium IEEE=LEOS Benelux chapter, 2004 (pp. 287-290). IEEE Society.