Closed loop thermal control of a lithographic optical component

R Saathof, A Haber, JW Spronck, M Verhaegen, RH Munnig Schmidt

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

2 Citations (Scopus)


In EUV lithography the high throughput and high absorption can cause thermal deformation of the mirrors, which induces image distortion. In a previous paper [1] we have presented an actuation mechanism that is suitable to compensate and correct for these thermal aberrations. In this paper we present a closed-loop control strategy to apply it on this actuation mechanism and its application on an experimental set-up.
Original languageEnglish
Title of host publicationProceedings ASPE Summer Topical Meeting - Precision Engineering and Mechatronics Supporting the Semiconductor Industry
EditorsJS Taylor, J van Eijk
Place of PublicationRayleigh, NC, USA
Number of pages6
ISBN (Print)978-1-887706-60-5
Publication statusPublished - 2012
EventASPE Summer Topical Meeting, Berkeley, CA, USA - Rayleigh, NC, USA
Duration: 24 Jun 201226 Jun 2012

Publication series



ConferenceASPE Summer Topical Meeting, Berkeley, CA, USA


  • conference contrib. refereed
  • Conf.proc. > 3 pag

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