Closed loop thermal control of a lithographic optical component

R Saathof; A Haber; JW Spronck; M Verhaegen; RH Munnig Schmidt

Closed loop thermal control of a lithographic optical component

R Saathof, A Haber, JW Spronck, M Verhaegen, RH Munnig Schmidt

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

2 Citations (Scopus)

Abstract

In EUV lithography the high throughput and high absorption can cause thermal deformation of the mirrors, which induces image distortion. In a previous paper [1] we have presented an actuation mechanism that is suitable to compensate and correct for these thermal aberrations. In this paper we present a closed-loop control strategy to apply it on this actuation mechanism and its application on an experimental set-up.

Original language	English
Title of host publication	Proceedings ASPE Summer Topical Meeting - Precision Engineering and Mechatronics Supporting the Semiconductor Industry
Editors	JS Taylor, J van Eijk
Place of Publication	Rayleigh, NC, USA
Publisher	ASPE
Pages	95-100
Number of pages	6
ISBN (Print)	978-1-887706-60-5
Publication status	Published - 2012
Event	ASPE Summer Topical Meeting, Berkeley, CA, USA - Rayleigh, NC, USA Duration: 24 Jun 2012 → 26 Jun 2012

Publication series

Name
Publisher	ASPE

Conference

Conference	ASPE Summer Topical Meeting, Berkeley, CA, USA
Period	24/06/12 → 26/06/12

Keywords

conference contrib. refereed
Conf.proc. > 3 pag

Cite this

@inproceedings{a194f15c703a45cda5edd2aa3eb2516d,

title = "Closed loop thermal control of a lithographic optical component",

abstract = "In EUV lithography the high throughput and high absorption can cause thermal deformation of the mirrors, which induces image distortion. In a previous paper [1] we have presented an actuation mechanism that is suitable to compensate and correct for these thermal aberrations. In this paper we present a closed-loop control strategy to apply it on this actuation mechanism and its application on an experimental set-up.",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "R Saathof and A Haber and JW Spronck and M Verhaegen and {Munnig Schmidt}, RH",

year = "2012",

language = "English",

isbn = "978-1-887706-60-5",

publisher = "ASPE",

pages = "95--100",

editor = "JS Taylor and {van Eijk}, J",

booktitle = "Proceedings ASPE Summer Topical Meeting - Precision Engineering and Mechatronics Supporting the Semiconductor Industry",

note = "ASPE Summer Topical Meeting, Berkeley, CA, USA ; Conference date: 24-06-2012 Through 26-06-2012",

}

Saathof, R, Haber, A, Spronck, JW , Verhaegen, M & Munnig Schmidt, RH 2012, Closed loop thermal control of a lithographic optical component. in JS Taylor & J van Eijk (eds), Proceedings ASPE Summer Topical Meeting - Precision Engineering and Mechatronics Supporting the Semiconductor Industry. ASPE, Rayleigh, NC, USA, pp. 95-100, ASPE Summer Topical Meeting, Berkeley, CA, USA, 24/06/12.

Closed loop thermal control of a lithographic optical component. / Saathof, R; Haber, A; Spronck, JW et al.
Proceedings ASPE Summer Topical Meeting - Precision Engineering and Mechatronics Supporting the Semiconductor Industry. ed. / JS Taylor; J van Eijk. Rayleigh, NC, USA: ASPE, 2012. p. 95-100.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Closed loop thermal control of a lithographic optical component

AU - Saathof, R

AU - Haber, A

AU - Spronck, JW

AU - Verhaegen, M

AU - Munnig Schmidt, RH

PY - 2012

Y1 - 2012

N2 - In EUV lithography the high throughput and high absorption can cause thermal deformation of the mirrors, which induces image distortion. In a previous paper [1] we have presented an actuation mechanism that is suitable to compensate and correct for these thermal aberrations. In this paper we present a closed-loop control strategy to apply it on this actuation mechanism and its application on an experimental set-up.

AB - In EUV lithography the high throughput and high absorption can cause thermal deformation of the mirrors, which induces image distortion. In a previous paper [1] we have presented an actuation mechanism that is suitable to compensate and correct for these thermal aberrations. In this paper we present a closed-loop control strategy to apply it on this actuation mechanism and its application on an experimental set-up.

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

UR - http://aspe.net/publications/summer_2012/aspe%202012%20summer%20proceedings%20final.pdf

M3 - Conference contribution

SN - 978-1-887706-60-5

SP - 95

EP - 100

BT - Proceedings ASPE Summer Topical Meeting - Precision Engineering and Mechatronics Supporting the Semiconductor Industry

A2 - Taylor, JS

A2 - van Eijk, J

PB - ASPE

CY - Rayleigh, NC, USA

T2 - ASPE Summer Topical Meeting, Berkeley, CA, USA

Y2 - 24 June 2012 through 26 June 2012

ER -

Closed loop thermal control of a lithographic optical component

Abstract

Publication series

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Keywords

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