CMOS-compatible metamaterial-based wideband mid-infrared absorber for microspectrometer applications

E. Karimishahmarvandi, M. Ghaderi, N. Pelin Ayerden, Ger de Graaf, Reinoud F. Wolffenbuttel

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

3 Citations (Scopus)


The design of a metamaterial-based absorber for use in a MEMS-based mid-IR microspectrometer is reported. The microspectrometer consists of a LVOF that is aligned with an array of thermopile detectors, which is fabricated on a SiN membrane and coated with the absorber. Special emphasis is put on the CMOS compatible fabrication, which results in an absorber design based on Al disc resonators and an Al background plane that are separated by an SiO2 layer. Wideband operation over the 3-4 μm spectral range is achieved by staggered tuning of four Al disk resonators in one 1.5 x 1.5 μm2 unit cell, using four different values of the radius of the Al disk between 0.50 μm and 0.63 μm and an SiO2 layer thickness of 150 nm. Simulations reveal an average absorption of about 95% with a ±4% ripple at normal incidence, which reduces to about 80% absorption at a 20° incidence angle. The influence of material choice and dimensions on a single absorption peak was studied and the magnetic polariton was identified as the underlying mechanism of absorption. © (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Original languageEnglish
Title of host publicationMetamaterials X
EditorsA.D. Boardman, N.P. Johnson, K.F. MacDonald, E. Özbay
Pages988309-1 - 988309-9
Number of pages9
Publication statusPublished - 2016
EventSPIE Photonics Europe 2016 - Brussels, Belgium
Duration: 3 Apr 20167 Apr 2016

Publication series

NameProceedings of SPIE
ISSN (Electronic)0277-786X


ConferenceSPIE Photonics Europe 2016
Internet address


  • plasmonic metamaterial absorber
  • microspectrometer
  • CMOS-compatible
  • infrared spectrum

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