Coating layer on samples with roughness: numerical study for coherent Fourier scatterometry

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Abstract

For the development of integrated circuits, the accompanying metrology inside the fabrication process is essential. Non-imaging metrology of nanostructure has to be quick and non-destructive. The multilayers are crucial components of today's microprocessor nanostructures and reflective coatings. Coherent Fourier scatterometry (CFS), which is currently employed as a method for determining certain parameters of nanostructures and isolated particle detection, has not been investigated in the context of multilayer characterization. Retrieving the thickness of many wavelength-thick films using a coherent visible-range source at a full-complex-field measurement is the specific application where CFS might be advantageous. Furthermore, due to polishing in the realistic multilayers, the anticipated optical performance suffers from stochastic changes relating to surface roughness. Few non-imaging metrology methods take into consideration these statistic variances and thus are of interest for this study. Operating in the visible regime, CFS can become a viable candidate to provide cover layer reconstruction in the presence of surface roughness that has a correlation length bigger than the characteristic spot size i.e., in the range of microns. We present forward model results of multilayer structure as measured with visible range CFS modality. The influence of surface roughness is taken into account and the simulation results are discussed. Simulations of micron-sized layers of dielectric on silicon substrate suggest an influence on the far field intensity that motivates a future extended study on experimental multiple wavelength thick cover layer reconstruction in the presence of roughness.

Original languageEnglish
Title of host publicationModeling Aspects in Optical Metrology IX
EditorsBernd Bodermann, Karsten Frenner
PublisherSPIE
Number of pages13
ISBN (Electronic)978-1-5106-6447-0
DOIs
Publication statusPublished - 2023
EventModeling Aspects in Optical Metrology IX 2023 - Munich, Germany
Duration: 26 Jun 202328 Jun 2023

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume12619
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceModeling Aspects in Optical Metrology IX 2023
Country/TerritoryGermany
CityMunich
Period26/06/2328/06/23

Keywords

  • multilayer
  • Optical metrology
  • roughness
  • scatterometry

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