Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist

D.J. Thoen^*, V. Murugesan, A. Pascual Laguna, K. Karatsu, A. Endo, J.J.A. Baselmans

^*Corresponding author for this work

Tera-Hertz Sensing

Research output: Contribution to journal › Article › Scientific › peer-review

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Engineering

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Material Science