Combining UV-and Electron beam lithography for superconducting bandpass filters in mm/sub-mm astronomy

D.J. Thoen, V. Murugesan, K. Karatsu, A. Pascual Laguna, A. Endo, J.J.A. Baselmans

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Abstract

Microfabrication of on-chip filterbanks, such as DESHIMA 2.0, would greatly benefit from reliable fabrication with sub-micrometer resolution. This enables smaller devices and reduces scatter in parameters such as filter bandwidth and resonant frequency. Here we present “mix-and-match” processing by combining optical and electron-beam exposures of a single layer of negative ma-N1405 resist from Micro-Resist-Technology GmbH. This allows for minimal features down to 300 nm where needed and large structure exposure with UV, limiting e-beam writing time. Relative alignment is possible to less than 500 nm on a regular basis.
Original languageEnglish
Title of host publicationMillimeter, Submillimeter, and Far-Infrared Detectors and Instrumentation for Astronomy X
Place of PublicationYokohama, Japan
PublisherSPIE
Volume11453
DOIs
Publication statusPublished - 2020

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