Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

AJ van Dodewaard, WSM Ketelaars, RFM Roes, JAJ Kwinten, FCMJM van Delft, AJ van Run, J Romijn, AK Suurling

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Proceedings Micro- and Nano Engineering Conference 1999
Editors	ED Fabrizio, M Gentilli, G Meneghini
Pages	461-464
Number of pages	4
Publication status	Published - 1999

Keywords

@inproceedings{85ad936a859e4aa396c0494d17420f39,

title = "Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "{van Dodewaard}, AJ and WSM Ketelaars and RFM Roes and JAJ Kwinten and {van Delft}, FCMJM and {van Run}, AJ and J Romijn and AK Suurling",

year = "1999",

language = "Undefined/Unknown",

pages = "461--464",

editor = "ED Fabrizio and M Gentilli and G Meneghini",

booktitle = "Proceedings Micro- and Nano Engineering Conference 1999",

}

TY - GEN

T1 - Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

AU - van Dodewaard, AJ

AU - Ketelaars, WSM

AU - Roes, RFM

AU - Kwinten, JAJ

AU - van Delft, FCMJM

AU - van Run, AJ

AU - Romijn, J

AU - Suurling, AK

PY - 1999

Y1 - 1999

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SP - 461

EP - 464

BT - Proceedings Micro- and Nano Engineering Conference 1999

A2 - Fabrizio, ED

A2 - Gentilli, M

A2 - Meneghini, G

ER -