Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

AJ van Dodewaard, WSM Ketelaars, RFM Roes, JAJ Kwinten, FCMJM van Delft, AJ van Run, AK Suurling

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)461-464
Number of pages4
JournalMicroelectronic Engineering
Issue number1-4
Publication statusPublished - 2000


  • ZX Int.klas.verslagjaar < 2002

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