Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

AJ van Dodewaard, WSM Ketelaars, RFM Roes, JAJ Kwinten, FCMJM van Delft, AJ van Run, AK Suurling

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	461-464
Number of pages	4
Journal	Microelectronic Engineering
Volume	53
Issue number	1-4
Publication status	Published - 2000

Keywords

@article{34146e90969b4e449c5929737af5e22f,

title = "Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "{van Dodewaard}, AJ and WSM Ketelaars and RFM Roes and JAJ Kwinten and {van Delft}, FCMJM and {van Run}, AJ and AK Suurling",

year = "2000",

language = "Undefined/Unknown",

volume = "53",

pages = "461--464",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "1-4",

}

TY - JOUR

T1 - Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

AU - van Dodewaard, AJ

AU - Ketelaars, WSM

AU - Roes, RFM

AU - Kwinten, JAJ

AU - van Delft, FCMJM

AU - van Run, AJ

AU - Suurling, AK

PY - 2000

Y1 - 2000

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 0167-9317

VL - 53

SP - 461

EP - 464

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1-4

ER -