Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

AJ van Dodewaard, WSM Ketelaars, RFM Roes, JAJ Kwinten, FCMJM van Delft, AJ van Run, J Romijn, AK Suurling

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Original languageUndefined/Unknown
Title of host publicationProceedings Micro- and Nano Engineering Conference 1999
EditorsED Fabrizio, M Gentilli, G Meneghini
Number of pages4
Publication statusPublished - 1999


  • ZX Int.klas.verslagjaar < 2002

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