Comperative study of atomic ayer deposition and low-pressure MOCVD of copper sulfide thin films.

B Meester, L Reijnen, APLM Goossens, J Schoonman

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Journal	The European Physical Journal. Special Topics
Volume	11
Publication status	Published - 2001

Keywords

@article{b8ca70f9f74347ec84aa4fdd3103fbb6,

title = "Comperative study of atomic ayer deposition and low-pressure MOCVD of copper sulfide thin films.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "B Meester and L Reijnen and APLM Goossens and J Schoonman",

year = "2001",

language = "Undefined/Unknown",

volume = "11",

journal = "The European Physical Journal. Special Topics",

issn = "1155-4339",

publisher = "EDP Sciences",

}

TY - JOUR

T1 - Comperative study of atomic ayer deposition and low-pressure MOCVD of copper sulfide thin films.

AU - Meester, B

AU - Reijnen, L

AU - Goossens, APLM

AU - Schoonman, J

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 1155-4339

VL - 11

JO - The European Physical Journal. Special Topics

JF - The European Physical Journal. Special Topics

ER -