Complex roughening of Si under oblique bombardment by low-energy oxygen ions.

PFA Alkemade, ZX Jiang

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	1699-1705
Number of pages	7
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	19
Issue number	5
Publication status	Published - 2000

Keywords

@article{93a43afc5f454f1eb7c502ea70df22a5,

title = "Complex roughening of Si under oblique bombardment by low-energy oxygen ions.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "PFA Alkemade and ZX Jiang",

year = "2000",

language = "Undefined/Unknown",

volume = "19",

pages = "1699--1705",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "5",

}

TY - JOUR

T1 - Complex roughening of Si under oblique bombardment by low-energy oxygen ions.

AU - Alkemade, PFA

AU - Jiang, ZX

PY - 2000

Y1 - 2000

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 1071-1023

VL - 19

SP - 1699

EP - 1705

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 5

ER -