Computational Modeling of Transport Phenomena and Detailed Chemistry in Chemical Vapor Deposition - a benchmark solution.

    Research output: Contribution to journalArticleScientificpeer-review

    76 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)294-306
    Number of pages13
    JournalThin Solid Films
    Volume365
    Issue number2
    Publication statusPublished - 2000

    Keywords

    • ZX Int.klas.verslagjaar < 2002

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