Original language | Undefined/Unknown |
---|---|
Pages (from-to) | 567-570 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 41-42 |
Publication status | Published - 1998 |
Contact and alignment marker technology for atomic scale device fabrication
MR Zuiddam, S Rogge, LJ Geerlings, EWJM van der Drift, B Ilge, G Palasantzas
Research output: Contribution to journal › Article › peer-review
4
Citations
(Scopus)