Contact and alignment marker technology for atomic scale device fabrication

MR Zuiddam, S Rogge, LJ Geerlings, EWJM van der Drift, B Ilge, G Palasantzas

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Pages (from-to)	567-570
Number of pages	4
Journal	Microelectronic Engineering
Volume	41-42
Publication status	Published - 1998

Cite this

@article{a10e8fc80ec5419c82c22e5b454caa74,

title = "Contact and alignment marker technology for atomic scale device fabrication",

author = "MR Zuiddam and S Rogge and LJ Geerlings and {van der Drift}, EWJM and B Ilge and G Palasantzas",

year = "1998",

language = "Undefined/Unknown",

volume = "41-42",

pages = "567--570",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}