Control of arsenic doping during low temperature CVD epitaxy of Silicon (100)

WD van Noort, LK Nanver, JW Slotboom

Research output: Contribution to journalArticleScientificpeer-review

17 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)4301-4304
Number of pages4
JournalElectrochemical Society. Journal
Volume147
Issue number11
Publication statusPublished - 2000

Keywords

  • ZX Int.klas.verslagjaar < 2002

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