Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature

Q Xu, MY Wu, GF Schneider, L Houben, SRK Malladi, C Dekker, E Yucelen, RE Dunin-Borkowski, HW Zandbergen

Research output: Contribution to journalArticleScientificpeer-review

96 Citations (Scopus)


We show that by operating a scanning transmission electron microscope (STEM) with a 0.1 nm 300 kV electron beam, one can sculpt free-standing monolayer graphene with close-to-atomic precision at 600 degrees C. The same electron beam that is used for destructive sculpting can be used to image the sculpted monolayer graphene nondestructively. For imaging, a scanning dwell time is used that is about 1000 times shorter than for the sculpting. This approach allows for Instantaneous switching between sculpting and imaging and thus fine-tuning the shape of the sculpted lattice. Furthermore, the sculpting process can be automated using a script. In this way, free-standing monolayer graphene can be controllably sculpted into patterns that are predefined in position, size, and orientation while maintaining defect-free crystallinity of the adjacent lattice. The sculpting and imaging processes can be fully computer-controlled to fabricate complex assemblies of ribbons or other shapes.
Original languageEnglish
Pages (from-to)1566-1572
Number of pages7
JournalACS Nano
Issue number2
Publication statusPublished - 2013


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