Controlled plasma nitriding for an optimum balance between PACVD TiBN coating scratch resistance and substrate toughness.

Y He, I Apachitei, J Zhou, T Walstock, J Duszczyk

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{cc35c2401be143f8a78a89aa3cdfc816,

title = "Controlled plasma nitriding for an optimum balance between PACVD TiBN coating scratch resistance and substrate toughness.",

keywords = "CWTS JFIS < 0.75",

author = "Y He and I Apachitei and J Zhou and T Walstock and J Duszczyk",

year = "2008",

language = "Undefined/Unknown",

volume = "367",

pages = "312--317",

journal = "Key Engineering Materials",

issn = "1013-9826",

publisher = "Trans Tech Publications",

}

TY - JOUR

T1 - Controlled plasma nitriding for an optimum balance between PACVD TiBN coating scratch resistance and substrate toughness.

AU - He, Y

AU - Apachitei, I

AU - Zhou, J

AU - Walstock, T

AU - Duszczyk, J

PY - 2008

Y1 - 2008

KW - CWTS JFIS < 0.75

M3 - Article

SN - 1013-9826

VL - 367

SP - 312

EP - 317

JO - Key Engineering Materials

JF - Key Engineering Materials

ER -