Crystallographic silicon-etching for ultra-high aspect-ratio FinFET

V Jovanovi¿; T Suligoj; LK Nanver

Crystallographic silicon-etching for ultra-high aspect-ratio FinFET

V Jovanovi¿, T Suligoj, LK Nanver

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

7 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	213th Electrochemical Society Meeting
Editors	PJ Timans, EP Gusev, H Iwai, DL Kwong, MC Ozturk, F Roozeboom
Place of Publication	s.l.
Publisher	ECS
Pages	313-320
Number of pages	8
ISBN (Print)	978-1-56677-626-4
Publication status	Published - 2008
Event	ECS meeting 2008, Phoenix, AZ, USA - s.l. Duration: 18 May 2008 → 22 May 2008

Publication series

Name
Publisher	ECS

Conference

Conference	ECS meeting 2008, Phoenix, AZ, USA
Period	18/05/08 → 22/05/08

Keywords

conference contrib. refereed
Conf.proc. > 3 pag

Cite this

@inproceedings{eb023fc7266d414ca8a1947014d7619a,

title = "Crystallographic silicon-etching for ultra-high aspect-ratio FinFET",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "V Jovanovi¿ and T Suligoj and LK Nanver",

year = "2008",

language = "Undefined/Unknown",

isbn = "978-1-56677-626-4",

publisher = "ECS",

pages = "313--320",

editor = "PJ Timans and EP Gusev and H Iwai and DL Kwong and MC Ozturk and F Roozeboom",

booktitle = "213th Electrochemical Society Meeting",

note = "ECS meeting 2008, Phoenix, AZ, USA ; Conference date: 18-05-2008 Through 22-05-2008",

}

Crystallographic silicon-etching for ultra-high aspect-ratio FinFET. / Jovanovi¿, V; Suligoj, T; Nanver, LK.
213th Electrochemical Society Meeting. ed. / PJ Timans; EP Gusev; H Iwai; DL Kwong; MC Ozturk; F Roozeboom. s.l.: ECS, 2008. p. 313-320.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Crystallographic silicon-etching for ultra-high aspect-ratio FinFET

AU - Jovanovi¿, V

AU - Suligoj, T

AU - Nanver, LK

PY - 2008

Y1 - 2008

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 978-1-56677-626-4

SP - 313

EP - 320

BT - 213th Electrochemical Society Meeting

A2 - Timans, PJ

A2 - Gusev, EP

A2 - Iwai, H

A2 - Kwong, DL

A2 - Ozturk, MC

A2 - Roozeboom, F

PB - ECS

CY - s.l.

T2 - ECS meeting 2008, Phoenix, AZ, USA

Y2 - 18 May 2008 through 22 May 2008

ER -