Deep dry etching process development for InP-based photonic crystals

R van der Heijden, EWJM van der Drift, EJ Geluk, RW van der Heijden, F Karouta, PAM Nouwens, YS Oei, T de Vries, HWM Salemink

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationProceedings 2003 Symposium of the IEEE/LEOS Benelux Chapter
EditorsR de Ridder, G Altena, D Geuzebroek, R Dekker
Place of PublicationEnschede
PublisherUniverteitsdrukkerij UTwente
Pages257-260
Number of pages4
ISBN (Print)90-365-1990-X
Publication statusPublished - 2003
EventSymposium of the IEEE/LEOS Benelux, Enschede - Enschede
Duration: 20 Nov 200321 Nov 2003

Publication series

Name
PublisherUniverteitsdrukkerij UTwente

Conference

ConferenceSymposium of the IEEE/LEOS Benelux, Enschede
Period20/11/0321/11/03

Keywords

  • Elektrotechniek
  • Techniek
  • conference contrib. refereed
  • Vakpubl., Overig wet. > 3 pag

Cite this

van der Heijden, R., van der Drift, EWJM., Geluk, EJ., van der Heijden, RW., Karouta, F., Nouwens, PAM., Oei, YS., de Vries, T., & Salemink, HWM. (2003). Deep dry etching process development for InP-based photonic crystals. In R. de Ridder, G. Altena, D. Geuzebroek, & R. Dekker (Eds.), Proceedings 2003 Symposium of the IEEE/LEOS Benelux Chapter (pp. 257-260). Univerteitsdrukkerij UTwente.