Deep dry etching process development for InP-based photonic crystals

R van der Heijden; EWJM van der Drift; EJ Geluk; RW van der Heijden; F Karouta; PAM Nouwens; YS Oei; T de Vries; HWM Salemink

Deep dry etching process development for InP-based photonic crystals

R van der Heijden, EWJM van der Drift, EJ Geluk, RW van der Heijden, F Karouta, PAM Nouwens, YS Oei, T de Vries, HWM Salemink

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Proceedings 2003 Symposium of the IEEE/LEOS Benelux Chapter
Editors	R de Ridder, G Altena, D Geuzebroek, R Dekker
Place of Publication	Enschede
Publisher	Univerteitsdrukkerij UTwente
Pages	257-260
Number of pages	4
ISBN (Print)	90-365-1990-X
Publication status	Published - 2003
Event	Symposium of the IEEE/LEOS Benelux, Enschede - Enschede Duration: 20 Nov 2003 → 21 Nov 2003

Publication series

Name
Publisher	Univerteitsdrukkerij UTwente

Conference

Conference	Symposium of the IEEE/LEOS Benelux, Enschede
Period	20/11/03 → 21/11/03

Keywords

Elektrotechniek
Techniek
conference contrib. refereed
Vakpubl., Overig wet. > 3 pag

Cite this

van der Heijden, R., van der Drift, EWJM., Geluk, EJ., van der Heijden, RW., Karouta, F., Nouwens, PAM., Oei, YS., de Vries, T., & Salemink, HWM. (2003). Deep dry etching process development for InP-based photonic crystals. In R. de Ridder, G. Altena, D. Geuzebroek, & R. Dekker (Eds.), Proceedings 2003 Symposium of the IEEE/LEOS Benelux Chapter (pp. 257-260). Univerteitsdrukkerij UTwente.

@inproceedings{c6409478f3e641e7a647265c885c376a,

title = "Deep dry etching process development for InP-based photonic crystals",

keywords = "Elektrotechniek, Techniek, conference contrib. refereed, Vakpubl., Overig wet. > 3 pag",

author = "{van der Heijden}, R and {van der Drift}, EWJM and EJ Geluk and {van der Heijden}, RW and F Karouta and PAM Nouwens and YS Oei and {de Vries}, T and HWM Salemink",

year = "2003",

language = "Undefined/Unknown",

isbn = "90-365-1990-X",

publisher = "Univerteitsdrukkerij UTwente",

pages = "257--260",

editor = "{de Ridder}, R and G Altena and D Geuzebroek and R Dekker",

booktitle = "Proceedings 2003 Symposium of the IEEE/LEOS Benelux Chapter",

note = "Symposium of the IEEE/LEOS Benelux, Enschede ; Conference date: 20-11-2003 Through 21-11-2003",

}

van der Heijden, R, van der Drift, EWJM, Geluk, EJ, van der Heijden, RW, Karouta, F, Nouwens, PAM, Oei, YS, de Vries, T & Salemink, HWM 2003, Deep dry etching process development for InP-based photonic crystals. in R de Ridder, G Altena, D Geuzebroek & R Dekker (eds), Proceedings 2003 Symposium of the IEEE/LEOS Benelux Chapter. Univerteitsdrukkerij UTwente, Enschede, pp. 257-260, Symposium of the IEEE/LEOS Benelux, Enschede, 20/11/03.

Deep dry etching process development for InP-based photonic crystals. / van der Heijden, R; van der Drift, EWJM; Geluk, EJ et al.
Proceedings 2003 Symposium of the IEEE/LEOS Benelux Chapter. ed. / R de Ridder; G Altena; D Geuzebroek; R Dekker. Enschede: Univerteitsdrukkerij UTwente, 2003. p. 257-260.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Deep dry etching process development for InP-based photonic crystals

AU - van der Heijden, R

AU - van der Drift, EWJM

AU - Geluk, EJ

AU - van der Heijden, RW

AU - Karouta, F

AU - Nouwens, PAM

AU - Oei, YS

AU - de Vries, T

AU - Salemink, HWM

PY - 2003

Y1 - 2003

KW - Elektrotechniek

KW - Techniek

KW - conference contrib. refereed

KW - Vakpubl., Overig wet. > 3 pag

M3 - Conference contribution

SN - 90-365-1990-X

SP - 257

EP - 260

BT - Proceedings 2003 Symposium of the IEEE/LEOS Benelux Chapter

A2 - de Ridder, R

A2 - Altena, G

A2 - Geuzebroek, D

A2 - Dekker, R

PB - Univerteitsdrukkerij UTwente

CY - Enschede

T2 - Symposium of the IEEE/LEOS Benelux, Enschede

Y2 - 20 November 2003 through 21 November 2003

ER -