Deposition of sacrificial silicon oxide layers by electron cyclotron resonance plasma

C Biasotto, AM Daltrini, RC Teixeira, FA Boscoli, JA Diniz, SA Moshkalev, I Doi

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)1166-1170
Number of pages5
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Issue number4
Publication statusPublished - 2007


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