Design and characterisation of an active mirror for EUV-lithography

R Saathof, GJM Schutten, JW Spronck, RH Munnig Schmidt

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)
Original languageEnglish
Pages (from-to)102-110
Number of pages9
JournalPrecision Engineering
Volume41
DOIs
Publication statusPublished - 2015

Keywords

  • CWTS JFIS < 0.75

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