Mechanical vibrations occuring in a production environment cause a relative motion between the sample and inspection tool that distorts measurements at the nanometer level. To overcome this problem, this paper proposes a metrology platform that maintains a constant relative distance to the sample by means of an H& inf;-feedback controller. Experiments in one degree of freedom show that the metrology platform can reduce vibrations as they occur in a production environment by one order of magnitude. Therefore, it enables in-line surface metrology at the nanometer level.
|Translated title of the contribution||Design and control of a positioning system for robot-based nanometrology|
|Number of pages||12|
|Publication status||Published - 2015|
- In-process measurement
- precision measurement
- precision positioning