| Original language | English |
|---|---|
| Pages (from-to) | 11-14 |
| Number of pages | 4 |
| Journal | Mikroniek: vakblad voor precisie-technologie |
| Volume | 2014 |
| Issue number | 3 |
| Publication status | Published - 2014 |
Design of an AM for EUV Lithography
R Saathof, JW Spronck, RH Munnig Schmidt
Research output: Contribution to journal › Article › Professional