@inproceedings{3f1c620587324a43be4c413c027cb2c8,
title = "Design rules for Patterning in Deep Cavities Formed by TMAH-etching of Si",
keywords = "conference contrib. refereed, Vakpubl., Overig wet. > 3 pag",
author = "L Gu and WHA Wien and LK Nanver",
year = "2008",
language = "Undefined/Unknown",
isbn = "978-90-73461-56-7",
publisher = "STW",
pages = "472--475",
editor = "s.n.",
booktitle = "The annual workshop on semiconductor advances for future electronics and sensors",
note = "SAFE 2008, Veldhoven, the Netherlands ; Conference date: 27-11-2008 Through 28-11-2008",
}