Detection of H2S, SO2, and NO2 using electrostatic sprayed tungsten oxide films

C Matei Ghimbeau, M Lumbreras, M Siadat, J Schoonman

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Pages (from-to)	1-8
Number of pages	8
Journal	Materials Science in Semiconductor Processing
Volume	13
Issue number	1
Publication status	Published - 2010

Keywords

@article{ec77df9780634cdc9260602d03d97ba1,

title = "Detection of H2S, SO2, and NO2 using electrostatic sprayed tungsten oxide films",

keywords = "CWTS JFIS < 0.75",

author = "{Matei Ghimbeau}, C and M Lumbreras and M Siadat and J Schoonman",

year = "2010",

language = "English",

volume = "13",

pages = "1--8",

journal = "Materials Science in Semiconductor Processing",

issn = "1369-8001",

publisher = "Elsevier",

number = "1",

}

TY - JOUR

T1 - Detection of H2S, SO2, and NO2 using electrostatic sprayed tungsten oxide films

AU - Matei Ghimbeau, C

AU - Lumbreras, M

AU - Siadat, M

AU - Schoonman, J

PY - 2010

Y1 - 2010

KW - CWTS JFIS < 0.75

M3 - Article

SN - 1369-8001

VL - 13

SP - 1

EP - 8

JO - Materials Science in Semiconductor Processing

JF - Materials Science in Semiconductor Processing

IS - 1

ER -