Determination of ion dose and profiles in 74Ge and 120Sn implanted silicon layers by PIXE, NAA RBS and SIMS

B Belin, P Bode, R Turan, TG van Meerten

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageUndefined/Unknown
    Pages (from-to)479-483
    Number of pages5
    JournalJournal of Radioanalytical and Nuclear Chemistry: an international journal dealing with all aspects and applications of nuclear chemistry
    Issue number2
    Publication statusPublished - 2004


    • ZX CWTS JFIS < 1.00

    Cite this