@article{d0ede0aef5d741c3a7302ae448434e1f,
title = "Determination of ion dose and profiles in 74Ge and 120Sn implanted silicon layers by PIXE, NAA RBS and SIMS",
keywords = "ZX CWTS JFIS < 1.00",
author = "B Belin and P Bode and R Turan and {van Meerten}, TG",
year = "2004",
language = "Undefined/Unknown",
volume = "261",
pages = "479--483",
journal = "Journal of Radioanalytical and Nuclear Chemistry: an international journal dealing with all aspects and applications of nuclear chemistry",
issn = "0236-5731",
publisher = "Elsevier",
number = "2",
}