Dry etching release of structures in post-processing surface micromachining using polyimide as a sacrificial layer

A Bagolini; HMT Pham; TLM Scholtes; L Pakula; PM Sarro

Dry etching release of structures in post-processing surface micromachining using polyimide as a sacrificial layer

A Bagolini, HMT Pham, TLM Scholtes, L Pakula, PM Sarro

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	SAFE2001: proceedings
Place of Publication	Utrecht
Publisher	STW Technology Foundation
Pages	769-772
Number of pages	4
ISBN (Print)	90-73461-29-4
Publication status	Published - 2001
Event	Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven - Utrecht Duration: 28 Nov 2001 → 30 Nov 2001

Publication series

Name
Publisher	STW technology foundation

Conference

Conference	Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven
Period	28/11/01 → 30/11/01

Keywords

ZX Int.klas.verslagjaar < 2002

Cite this

@inproceedings{befd2cab14554c01ac6d70ed549b809c,

title = "Dry etching release of structures in post-processing surface micromachining using polyimide as a sacrificial layer",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "A Bagolini and HMT Pham and TLM Scholtes and L Pakula and PM Sarro",

year = "2001",

language = "Undefined/Unknown",

isbn = "90-73461-29-4",

publisher = "STW Technology Foundation",

pages = "769--772",

booktitle = "SAFE2001: proceedings",

note = "Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven ; Conference date: 28-11-2001 Through 30-11-2001",

}

Bagolini, A, Pham, HMT, Scholtes, TLM , Pakula, L & Sarro, PM 2001, Dry etching release of structures in post-processing surface micromachining using polyimide as a sacrificial layer. in SAFE2001: proceedings. STW Technology Foundation, Utrecht, pp. 769-772, Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven, 28/11/01.

TY - GEN

T1 - Dry etching release of structures in post-processing surface micromachining using polyimide as a sacrificial layer

AU - Bagolini, A

AU - Pham, HMT

AU - Scholtes, TLM

AU - Pakula, L

AU - Sarro, PM

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 90-73461-29-4

SP - 769

EP - 772

BT - SAFE2001: proceedings

PB - STW Technology Foundation

CY - Utrecht

T2 - Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven

Y2 - 28 November 2001 through 30 November 2001

ER -