DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device

BJ Vleeming, JTLR Leene, EWJM van der Drift, J Romijn

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	81-84
Number of pages	4
Journal	Microelectronic Engineering
Volume	30
Publication status	Published - 1996

Cite this

@article{97988855f26541c28ee6a56f688ba4b5,

title = "DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device",

author = "BJ Vleeming and JTLR Leene and {van der Drift}, EWJM and J Romijn",

year = "1996",

language = "Undefined/Unknown",

volume = "30",

pages = "81--84",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}