Effect of the pulse offset on the thermal cycle for double excimer laser annealing of implanted silicon

V Gonda; LK Nanver

Effect of the pulse offset on the thermal cycle for double excimer laser annealing of implanted silicon

V Gonda, LK Nanver

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	English
Title of host publication	Proceedings of OGET conference
Editors	s.n.
Place of Publication	Gyergyószentmiklós, Romania
Publisher	Hungarian Technical Scientific Society of Transylvania, Romania
Pages	135-138
Number of pages	4
Publication status	Published - 2009
Event	OGET Conference, Gyergyószentmiklós, Romania - Gyergyószentmiklós, Romania Duration: 23 Apr 2009 → 26 Apr 2009

Publication series

Name
Publisher	Hungarian Technical Scientific Society of Transylvania, Romania

Conference

Conference	OGET Conference, Gyergyószentmiklós, Romania
Period	23/04/09 → 26/04/09

Bibliographical note

Een Hongaars artikel met alleen een Engelse vertaling van de titel.

Keywords

Vakpubl., Overig wet. > 3 pag

Cite this

@inproceedings{1b05efd2613a4b03bd3ba0b5f333097e,

title = "Effect of the pulse offset on the thermal cycle for double excimer laser annealing of implanted silicon",

keywords = "Vakpubl., Overig wet. > 3 pag",

author = "V Gonda and LK Nanver",

note = "Een Hongaars artikel met alleen een Engelse vertaling van de titel.; OGET Conference, Gyergy{\'o}szentmikl{\'o}s, Romania ; Conference date: 23-04-2009 Through 26-04-2009",

year = "2009",

language = "English",

publisher = "Hungarian Technical Scientific Society of Transylvania, Romania",

pages = "135--138",

editor = "s.n.",

booktitle = "Proceedings of OGET conference",

}

Effect of the pulse offset on the thermal cycle for double excimer laser annealing of implanted silicon. / Gonda, V; Nanver, LK.
Proceedings of OGET conference. ed. / s.n. Gyergyószentmiklós, Romania: Hungarian Technical Scientific Society of Transylvania, Romania, 2009. p. 135-138.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Effect of the pulse offset on the thermal cycle for double excimer laser annealing of implanted silicon

AU - Gonda, V

AU - Nanver, LK

N1 - Een Hongaars artikel met alleen een Engelse vertaling van de titel.

PY - 2009

Y1 - 2009

KW - Vakpubl., Overig wet. > 3 pag

M3 - Conference contribution

SP - 135

EP - 138

BT - Proceedings of OGET conference

A2 - s.n., null

PB - Hungarian Technical Scientific Society of Transylvania, Romania

CY - Gyergyószentmiklós, Romania

T2 - OGET Conference, Gyergyószentmiklós, Romania

Y2 - 23 April 2009 through 26 April 2009

ER -