Effects of the SiO2 capping layer on the location-controlled Si grain by u-Czochralski (grain filter) process with excimer-laser

M He, R Ishihara, Y Hiroshima, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Original languageUndefined/Unknown
Title of host publicationProceedings of the 11th International Display Workshops (IDW '04)
EditorsT Uchida, T Sugiura, Y Shimodaira
Place of PublicationNiigata
PublisherITE and SID
Number of pages4
Publication statusPublished - 2004
Event11th International Display Workshops, Niigata, Japan - Niigata
Duration: 8 Dec 200410 Dec 2004

Publication series

PublisherITE and SID


Conference11th International Display Workshops, Niigata, Japan


  • Conf.proc. > 3 pag

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