Electrical Characterization of Residual Implantation-Induced Defects in the Vicinity of Laser-Annealed Implanted Ultrashallow Junctions in Doping Engineering for Device Fabrication

V Gonda, S Liu, TLM Scholtes, LK Nanver

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationMaterial Research Society Symposium Proceedings (912, Warrendale, PA)
EditorsBJ Pawlak
Place of PublicationSan Francisco, USA
PublisherMaterial Research Society
Publication statusPublished - 2006
EventMRS Spring Meeting - San Francisco, USA
Duration: 17 Apr 200621 Apr 2006

Publication series

PublisherMaterial Research Society


ConferenceMRS Spring Meeting

Bibliographical note

page: 0912-C05-02, isbn: 978-1-55899-868-1


  • conference contrib. refereed
  • Conf.proc. > 3 pag

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