Electron beam exposure system

M Wieland (Inventor), B Kampherbeek (Inventor), A van Veen (Inventor), P Kruit (Inventor)

    Research output: Patent

    Original languageUndefined/Unknown
    Patent numberUS 6897458 B2
    IPCA61N, H01L, B82Y, H01J, G03B, G03F, G01Q
    Priority date30/10/02
    Publication statusPublished - 2005

    Bibliographical note

    Patent: CTP 167535
    Applicant: TU Delft, MAPPER Lithography B.V., MAPPER LITHOGRAPHY IP B.V.

    Keywords

    • Octrooi

    • Electron beam exposure system

      Wieland, MJJ., van Veen, AHV., Kampherbeek, BJ. & Kruit, P., 2004, IPC No. A61N, H01L, B82Y, H01J, G03B, G03F, G01Q, Priority date 30 Oct 2002, Priority No. WO 2004040614 A2

      Research output: Patent

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