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Electron beam exposure system

  • MJJ Wieland (Inventor)
  • , AHV van Veen (Inventor)
  • , BJ Kampherbeek (Inventor)
  • , P Kruit (Inventor)

    Research output: Patent

    Original languageUndefined/Unknown
    IPCA61N, H01L, B82Y, H01J, G03B, G03F, G01Q
    Priority date30/10/02
    Publication statusPublished - 2004

    Bibliographical note

    Patent: CTP 167535
    Applicant: TU Delft, MAPPER Lithography B.V., MAPPER LITHOGRAPHY IP B.V.

    • Electron beam exposure system

      Wieland, M. (Inventor), Kampherbeek, B. (Inventor), van Veen, A. (Inventor) & Kruit, P. (Inventor), 2005, IPC No. A61N, H01L, B82Y, H01J, G03B, G03F, G01Q, Patent No. US 6897458 B2, Priority date 30 Oct 2002

      Research output: Patent

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