Electron beam exposure system

M Wieland (Inventor), B Kampherbeek (Inventor), A van Veen (Inventor), P Kruit (Inventor)

Research output: Patent

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2004

Electron beam exposure system
Wieland, MJJ., van Veen, AHV., Kampherbeek, BJ. & Kruit, P., 2004, IPC No. A61N, H01L, B82Y, H01J, G03B, G03F, G01Q, Priority date 30 Oct 2002, Priority No. WO 2004040614 A2
Research output: Patent