Electron-beam-induced deposition of platinum at very low landing energies

APJM Botman, DAM de Winter, JJL Mulders

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	2460-2463
Number of pages	4
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	26
Issue number	6
Publication status	Published - 2008

Keywords

@article{89176c8f43334ee09133c8d8bd9d8445,

title = "Electron-beam-induced deposition of platinum at very low landing energies",

keywords = "CWTS 0.75 <= JFIS < 2.00",

author = "APJM Botman and {de Winter}, DAM and JJL Mulders",

year = "2008",

language = "Undefined/Unknown",

volume = "26",

pages = "2460--2463",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Electron-beam-induced deposition of platinum at very low landing energies

AU - Botman, APJM

AU - de Winter, DAM

AU - Mulders, JJL

PY - 2008

Y1 - 2008

KW - CWTS 0.75 <= JFIS < 2.00

M3 - Article

SN - 1071-1023

VL - 26

SP - 2460

EP - 2463

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 6

ER -