Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: The role of dissociative ionization and dissociative electron attachment in the deposition process

T. P. Ragesh Kumar, Sangeetha Hari, Krishna K. Damodaran, Oddur Ingólfsson*, Cornelis W. Hagen

*Corresponding author for this work

Research output: Contribution to journal › Article › Scientific › peer-review

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