electron beam induced depositionon graphene on silicon oxide and hexagonal boron nitride: A comparisaon of substrates

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Pages (from-to)	122-126
Number of pages	5
Journal	Microelectronic Engineering
Volume	121
Publication status	Published - 2014

Keywords

@article{2713c70c53b24847ad061e0501606699,

title = "electron beam induced depositionon graphene on silicon oxide and hexagonal boron nitride: A comparisaon of substrates",

keywords = "CWTS 0.75 <= JFIS < 2.00",

author = "S Hari and AM Goossens and LMK Vandersypen and CW Hagen",

year = "2014",

language = "English",

volume = "121",

pages = "122--126",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - electron beam induced depositionon graphene on silicon oxide and hexagonal boron nitride: A comparisaon of substrates

AU - Hari, S

AU - Goossens, AM

AU - Vandersypen, LMK

AU - Hagen, CW

PY - 2014

Y1 - 2014

KW - CWTS 0.75 <= JFIS < 2.00

UR - https://www.scopus.com/pages/publications/84901003792

M3 - Article

SN - 0167-9317

VL - 121

SP - 122

EP - 126

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -