TY - JOUR
T1 - Electron tunnelling and critical current behaviour of patterned Y1Ba2Cu3O7 - δ films
AU - Gijs, M. A.M.
AU - Dam, B.
AU - Heijman, M. G.J.
AU - Van Elswijk, T. H.A.W.
PY - 1989/5/15
Y1 - 1989/5/15
N2 - We report on point contact tunnelling experiments on preferentially c oriented Y1Ba2Cu3O7-δ (123) films deposited onto (100) SrTiO3 substrates using an ultra-high vacuum (UHV) triple electron-gun system with BaF2, yttrium and copper as source materials. The films were coated with a thin silver layer and annealed at 450°C. A niobium point was then carefully brought into contact with the surface, which was investigated by electron tunnelling. Using 10 GHz radiation we identified microwave-induced current steps in the current-voltage characteristic. Also, there was a strong decrease in Josephson current on application of a magnetic field. Moreover, UHV films were patterned into strips as narrow as 10 μm using a reactive ion etching technique. Critical current densities of about 106 A cm-2 at 20 K were obtained, which is an order of magnitude larger than for sputtered films, but smaller than for UHV laser-patterned thinner films.
AB - We report on point contact tunnelling experiments on preferentially c oriented Y1Ba2Cu3O7-δ (123) films deposited onto (100) SrTiO3 substrates using an ultra-high vacuum (UHV) triple electron-gun system with BaF2, yttrium and copper as source materials. The films were coated with a thin silver layer and annealed at 450°C. A niobium point was then carefully brought into contact with the surface, which was investigated by electron tunnelling. Using 10 GHz radiation we identified microwave-induced current steps in the current-voltage characteristic. Also, there was a strong decrease in Josephson current on application of a magnetic field. Moreover, UHV films were patterned into strips as narrow as 10 μm using a reactive ion etching technique. Critical current densities of about 106 A cm-2 at 20 K were obtained, which is an order of magnitude larger than for sputtered films, but smaller than for UHV laser-patterned thinner films.
UR - http://www.scopus.com/inward/record.url?scp=0024663974&partnerID=8YFLogxK
U2 - 10.1016/0022-5088(89)90350-0
DO - 10.1016/0022-5088(89)90350-0
M3 - Article
AN - SCOPUS:0024663974
SN - 0022-5088
VL - 151
SP - 435
EP - 441
JO - Journal of The Less-Common Metals
JF - Journal of The Less-Common Metals
IS - C
ER -