Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.

AM Nugrowati, AS van de Nes, SF Pereira, JJM Braat

Research output: Contribution to conferencePosterProfessional

Original languageUndefined/Unknown
Publication statusPublished - 2005
EventAdvanced Optical Imaging, Topical meeting of the EOS - London, UK, London, United Kingdom
Duration: 29 Jun 200530 Jun 2005

Other

OtherAdvanced Optical Imaging, Topical meeting of the EOS
CountryUnited Kingdom
CityLondon
Period29/06/0530/06/05

Keywords

  • other public output
  • Geen BTA classificatie

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