Enhanced lithographic resolution using longitudinal polarization state of light

MP Van, K Ushakova, CWM Bastiaansen, SF Pereira, HP Urbach, DJ Broer

Research output: Contribution to journal › Article › Scientific › peer-review

3 Citations (Scopus)

Original language	Undefined/Unknown
Pages (from-to)	1-9
Number of pages	9
Journal	Journal of Micro/Nanolithography, MEMS, and MOEMS
Volume	14
Issue number	4
DOIs	https://doi.org/10.1117/1.JMM.14.4.043509
Publication status	Published - 2015

043509

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title = "Enhanced lithographic resolution using longitudinal polarization state of light",

author = "MP Van and K Ushakova and CWM Bastiaansen and SF Pereira and HP Urbach and DJ Broer",

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TY - JOUR

T1 - Enhanced lithographic resolution using longitudinal polarization state of light

AU - Van, MP

AU - Ushakova, K

AU - Bastiaansen, CWM

AU - Pereira, SF

AU - Urbach, HP

AU - Broer, DJ

N1 - 043509

PY - 2015

Y1 - 2015

U2 - 10.1117/1.JMM.14.4.043509

DO - 10.1117/1.JMM.14.4.043509

M3 - Article

SN - 1932-5150

VL - 14

SP - 1

EP - 9

JO - Journal of Micro/Nanolithography, MEMS, and MOEMS

JF - Journal of Micro/Nanolithography, MEMS, and MOEMS

IS - 4

ER -