INIS
accuracy
20%
air
40%
comparative evaluations
20%
devices
40%
etching
40%
gallium nitrides
100%
gases
60%
heaters
40%
membranes
20%
nitrides
20%
nitrogen dioxide
40%
oxidation
20%
oxygen
20%
performance
20%
plasma
20%
precision
20%
sensitivity
100%
sensors
100%
values
20%
Engineering
Fast Response
25%
Gas Sensor
50%
Heterojunctions
100%
High Accuracy
25%
Membrane
25%
Nitride
25%
Repeatability
25%
Response Time
50%
Sensing Performance
25%
Sensor
50%
Temperature
25%
Temperature Increase
25%
Using Sensor
100%
Material Science
Air
50%
Devices
50%
Gas
75%
Heterojunction
100%
Membrane Structure
25%
Nitride Compound
25%
Nitrogen Dioxide
50%
Oxidation Reaction
25%
Temperature
50%
Wet Etching
25%
Immunology and Microbiology
Accuracy
33%
Blood Plasma
33%
Cross Allergy
33%
Gas
100%
Membrane Structure
33%
Oxidation
33%
Reaction Time
66%
Temperature
66%
Time
33%
Keyphrases
NO Sensor
100%
Plasma Oxidation
20%
Recess Etching
20%