Enlargement of location control grains grown from the grain filter with excimer laser by the capping layer

M He, R Ishihara, Y Hiroshima, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Original languageUndefined/Unknown
Title of host publicationProceedings of the 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE)
EditorsW Krautschneider, C Claeys
Place of PublicationUtrecht
PublisherSTW Technology Foundation
Pages647-650
Number of pages4
ISBN (Print)90-73461-43-X
Publication statusPublished - 2004
Event7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE), Veldhoven, the Netherlands - Utrecht
Duration: 25 Nov 200426 Nov 2004

Publication series

Name
PublisherSTW Technology Foundation

Conference

Conference7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE), Veldhoven, the Netherlands
Period25/11/0426/11/04

Keywords

  • Vakpubl., Overig wet. > 3 pag

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