EUV mask feature reconstruction via phase retrieval

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

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Abstract

EUV lithography is the main candidate for patterning of future technology nodes. Its successful implementation depends on many aspects, among which the availability of actinic mask metrology tools able to inspect the patterned absorber in order to control and monitor the lithographic process. In this work, we perform a simulation study to assess the performance of coherent diffractive imaging (CDI) and related phase retrieval methods for the reconstruction of non-Trivially shaped and a-periodic nanostructures from far field intensity data.

Original languageEnglish
Title of host publicationProceedings of SPIE
Subtitle of host publicationNanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI
EditorsBalaji Panchapakesan, Andre-Jean Attias, Andre-Jean Attias
PublisherSPIE
Number of pages8
Volume11089
ISBN (Electronic)978-151062871-7
DOIs
Publication statusPublished - 2019
EventNanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI 2019 - San Diego, United States
Duration: 11 Aug 201914 Aug 2019

Publication series

NameNANOENGINEERING: FABRICATION, PROPERTIES, OPTICS, THIN FILMS, AND DEVICES XVI
ISSN (Print)0277-786X

Conference

ConferenceNanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI 2019
CountryUnited States
CitySan Diego
Period11/08/1914/08/19

Keywords

  • CDI
  • EUV mask metrology
  • phase retrieval

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