EUV phase mask engineering based on image optimisation.

AM Nugrowati, AS van de Nes, SF Pereira, JJM Braat

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)684-687
Number of pages4
JournalMicroelectronic Engineering
Volume83
Publication statusPublished - 2006

Keywords

  • professional journal papers
  • CWTS 0.75 <= JFIS < 2.00

Cite this