@inproceedings{a0b075330c1c4a0284ba37f38b1b0588,
title = "Experimental validation of a piezoelectrically driven photomask curvature manipulator",
abstract = "Photolithography is the critical step in realizing a smaller feature size of Integrated Circuits (IC). Manufacturing beyond the 30 [nm] node requires tighter focus budgets in ArF immersion lithography systems [1]. Wafer non-flatness and lens heating are main focus-budget contributors [2, 3]. Their contribution can be reduced by exposing the wafer with a curved instead of the conventional flat focal plane (Figure 1). This effect is achieved by manipulating the photomask curvature during the exposure process. A piezoelectric actuation system has been developed for this purpose which can control the photomask curvature [4]. This paper revisits the actuation principle and presents the experimental validation of the concept in a functional model.",
keywords = "conference contrib. refereed, Conf.proc. > 3 pag",
author = "CL Valentin and JPM Vermeulen and {van Bree}, BCT and {Munnig Schmidt}, RH",
year = "2012",
language = "English",
isbn = "978-0-9566790-0-0",
publisher = "EUSPEN",
pages = "556--559",
editor = "P Shore and H Spaan and T Burke",
booktitle = "Proceedings of the 12th international conference of the european society for precision engineering and nanotechnology, EUSPEN, June 4-7, 2012, Stockholm, Sweden",
note = "12th international conference of the european society for precision engineering and nanotechnology, EUSPEN, Stockholm, Sweden ; Conference date: 04-06-2012 Through 07-06-2012",
}