Experimental validation of a piezoelectrically driven photomask curvature manipulator

CL Valentin, JPM Vermeulen, BCT van Bree, RH Munnig Schmidt

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Abstract

Photolithography is the critical step in realizing a smaller feature size of Integrated Circuits (IC). Manufacturing beyond the 30 [nm] node requires tighter focus budgets in ArF immersion lithography systems [1]. Wafer non-flatness and lens heating are main focus-budget contributors [2, 3]. Their contribution can be reduced by exposing the wafer with a curved instead of the conventional flat focal plane (Figure 1). This effect is achieved by manipulating the photomask curvature during the exposure process. A piezoelectric actuation system has been developed for this purpose which can control the photomask curvature [4]. This paper revisits the actuation principle and presents the experimental validation of the concept in a functional model.
Original languageEnglish
Title of host publicationProceedings of the 12th international conference of the european society for precision engineering and nanotechnology, EUSPEN, June 4-7, 2012, Stockholm, Sweden
EditorsP Shore, H Spaan, T Burke
Place of PublicationStockholm, Sweden
PublisherEUSPEN
Pages556-559
Number of pages4
ISBN (Print)978-0-9566790-0-0
Publication statusPublished - 2012
Event12th international conference of the european society for precision engineering and nanotechnology, EUSPEN, Stockholm, Sweden - Stockholm, Sweden
Duration: 4 Jun 20127 Jun 2012

Publication series

Name
PublisherEUSPEN

Conference

Conference12th international conference of the european society for precision engineering and nanotechnology, EUSPEN, Stockholm, Sweden
Period4/06/127/06/12

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

Fingerprint Dive into the research topics of 'Experimental validation of a piezoelectrically driven photomask curvature manipulator'. Together they form a unique fingerprint.

Cite this