Extreme UV Lithography, A candidate for next-generation lithography.

JJM Braat

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Photonics, Devices and Systems, Proceedings of SPIE
Editors	M Hrabovysky, P Tomanek, M Miler
Pages	2-7
Number of pages	6
Publication status	Published - 1999

Name

Name
Volume	4016

Keywords

@inproceedings{0a1e09ec04bb49cf9031d5588998afd6,

title = "Extreme UV Lithography, A candidate for next-generation lithography.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "JJM Braat",

year = "1999",

language = "Undefined/Unknown",

isbn = "0277-786-00",

pages = "2--7",

editor = "M Hrabovysky and P Tomanek and M Miler",

booktitle = "Photonics, Devices and Systems, Proceedings of SPIE",

}